This expert holds Ph.D. and M.S. degrees in Materials Science and Engineering from a prestigious university. This expert's dissertation centered on plasma chemical vapor deposition (CVD). This expert began a career at a manufacturing company in various engineering and technology positions, including product development, core technologist in the area of ultra-high purity chemical systems, project management, and engineering management. While at this company, this expert worked on the development of one of the industry's first single-wafer, multi-chamber platforms. This tool provides multiple chamber configurations for CVD, Etch and photoresist strip applications, supporting more than 50 unique processes. Later, this expert started the customer engineering specials (CES) department of the CVD division, and gained extensive design experience. As an authority in CVD, this expert has been requested as a third-party consultant in semiconductor business processes to produce Thin Films. This expert is also recognized for expertise in Plasma-Enhanced Chemical Vapor Deposition (PECVD), a sub-category of CVD, Sputtering, and various other Thin Film processes. This expert is experienced in providing IP litigation support, including the areas of patents, trade secrets, and economic espionage. This expert has testified in large scale technology contracts, and arbitration, before the Federal District Court, Tokyo High Court, International Trade Commission, and in International Arbitration. This expert's testimony has contributed to findings of patent infringement, patent invalidity, inequitable conduct, and responsibility for significant damages. This expert holds three patents in the fields of chemical vapor deposition, ultra-high purity and high temperature valving.
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